Large substrate (panel level, square substrate) developing equipment
Automatically executes a series of processes from developing to rinsing and spin drying!
We would like to introduce our "Large Substrate (Panel Level, Square Substrate) Development Equipment." By simply setting a FOUP or dedicated cassette in the load port, a clean robot automatically transports the workpiece and performs a series of processes including development, rinsing, and spin drying. We can also accommodate the production of manual development equipment. The workpiece sizes supported are 300x300mm, 510x515mm, and 600x600mm. The materials compatible with the workpieces include Si, resin, glass, SUS plates, etc., and it is possible to integrate the development liquid supply unit within the equipment (canister or poly tank). 【Specifications (partial)】 ■ Development liquid: TMAH, Na2CO3, cyclopentane, etc. (independent chamber) ■ Rinse liquid: DIW, PGMEA, etc. ■ Back rinse: PGMEA, etc. ■ Application method: Shower or nozzle ■ Bake: 90℃ to 120℃ ±1℃ ■ Cool plate: 10℃ to 25℃ *For more details, please download the PDF or feel free to contact us.
- 企業：LC 洗浄装置事業部
- 価格：Other
